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작성자: 관리자 작성일: 2008-11-05 조회수: 6662 File 1: Invitation_[F].pdf Size: 603.12kB Down: 1774 |
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You are cordially invited to attend and contribute to International Workshop on Emerging Materials & Active Polymer Patterning that will take place at YonseiUniversity, Seoul in Korea from Nov. 19th(Wed) to Nov. 22th(Sat) , 2008 Workshop focus on active patterning of polymeric or emerging material system , hosted by Active Polymer Center for Pattern Integration (APCPI) in Yonsei University. Topics for the workshop include: photoswitching/photoelectrochemical technology, intercalation material, and nanotechnology for various functional materials. The workshop, “Emerging Materials & Active Polymer Patterning”, is expected to attract many participants in different expertise and provides all scientists and engineers with an opportunity to exchange academic and practical ideas among all participants.We look forward to the pleasure of being with you at this conference, and hope it will be an enjoyable and memorable meeting for all participants. Your Sincerely, EunkyoungKim, Director of Active Polymer Center for Pattern IntegrationDirector of Innovation Cluster for Bio-Fusion Industry based on NanoTechnology ChulSooShin, Chairman of YonseiBiomedical Science and Technology Initiative ※ 자세한 내용은 첨부파일 참고하시기 바랍니다. |
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